Zoilo C. H. Tan received the B.S. degree in chemical engineering from Cheng Kung University, Taiwan, in 1963, the M.S. degree in physical chemistry from the University of Arkansas in 1966, and the Ph.D. degree in nuclear chemistry from the Massachusetts Institute of Technology in 1969. His research interests are in the development of resist and processes for advanced microlithography. He was the key inventor of Kodak MX 771 X-ray resist and ZX 784 e-beam resist. Following a brief career as staff scientist at Synertek Inc., he joined the Gate Array Division of Fairchild Semiconductor in 1985, where he was engaged in various resist processes for both optical and e-beam lithography. He is currently Manager of the E-Beam Center, Varian Research Center, Varian Associates, Inc., Palo Alto, CA.